Novel approach to recurrent implantation failure: short-term copper IUD placement

Reflections
Novel approach to recurrent implantation failure: short-term copper IUD placement

Volume 108, Issue 1, Pages 42–43

Authors:

Linnea R. Goodman, M.D., Jason M. Franasiak, M.D.

Abstract:

Reflections on "Short-term copper intrauterine device placement improves the implantation and pregnancy rates in women with repeated implantation failure" by Mao et al.

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